| MATTSON
TECHNOLOGY, INC. ANNOUNCES $45.6 MILLION PRIVATE PLACEMENT
OF COMMON STOCK MATTSON TECHNOLOGY STRENGTHENS POSITION IN
CHINA WITH STRIP ORDER FROM SEMICONDUCTOR MANUFACTURING INTERNATIONAL
CORP
FREMONT, CA. March 27, 2002 - Mattson Technology, Inc. (Nasdaq:
MTSN), a leading supplier of semiconductor wafer processing
equipment used in "front-end" fabrication of
integrated circuits, announced today that it has received
an order for its Aspen II ICP Strip system from Shanghai-based
silicon foundry company Semiconductor Manufacturing International
Corp. (SMIC). The order is scheduled to begin shipment
by the end of March and will be installed in SMIC's Fab
1, located in the Pudong New Area Hi-Tech Industrial Park.
The Aspen II Strip system will be used for plasma resist
strip applications.
SMIC President and CEO Dr. Richard Chang said, "We
chose Mattson's Aspen II ICP Strip system over competitive
systems because of its excellent productivity, high reliability
and flexibility and low cost of ownership in running multiple
process applications that are critical to the foundry business
environment. The Aspen Strip's proven production track record
and Mattson's global support were critical factors in our
decision."
Julian Chu, country manager for Mattson Technology's China
Operation, said, "We already have several AWP wet processing
systems installed at SMIC, and we are pleased to strengthen
our relationship with such a notable foundry with this strip
order. Mattson currently has an installed base of more than
800 strip systems worldwide, and the SMIC order not only
reinforces Mattson's leadership position in the strip arena,
but it also underscores the growing acceptance of our leading-edge
tools in the burgeoning China market."
About the Aspen II Strip
The Aspen II Strip system features Mattson's proprietary
inductively coupled plasma (ICP) source for advanced sub-micron
applications that require ultra-low contamination levels.
The Aspen II Strip system offers the most advanced technology
on a high productivity platform. The system combines zero
damage and low contamination drive-in with high throughput
and effectively strips resist and residue without the need
for post-strip chemical processing. The Aspen II Strip
provides chipmakers the process performance they require
for advanced device manufacturing at the low cost of ownership
they need to compete in today's market.
About Mattson
Technology, Inc.
Mattson Technology,
Inc. is a leading supplier of semiconductor wafer processing
equipment used in "front-end" fabrication
of integrated circuits. The company is a market leader in
dry strip and RTP equipment, and its products combine advanced
process technology on high-productivity platforms backed
by industry-leading support. Since beginning operations in
1989, the company’s core vision has been to help bring
technology leadership and productivity gains to semiconductor
manufacturers worldwide. Headquartered in Fremont, Calif.,
the company maintains sales and support centers throughout
the United States, Europe and Asia. For more information,
please contact Mattson Technology, Inc., 47131 Bayside Parkway,
Fremont, Calif. 94538. Telephone: (800) MATTSON/(510) 657-5900.
Fax: (510) 492-5911. Internet: www.mattson.com.
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