LEADING CHINA FOUNDRY SELECTS MATTSON TECHONOLOGY FOR NEW 300 MM FAB

FREMONT, Calif.- August 17, 2004 - Mattson Technology, Inc. (NASDAQ: MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, today announced that a leading foundry in China has selected its Aspen III Strip system for its new 300 mm fab. The system, which has recently been installed in the foundry’s new facility, will be used for the photoresist recess processes to produce DRAM and logic devices.

“This leading foundry selected our Aspen III Strip system based on its advanced technology capabilities, high reliability and cost of ownership advantages,” said Randy Y. Matsuda, vice president and general manager of Mattson Technology’s Films-Etch Product Group. “The 300 mm strip system, which complements a significant Mattson strip system installed base at this customer’s other 200 mm fabs, provides industry-leading performance and is playing a key role at its new fab as our customer leads China toward advanced semiconductor manufacturing.”

“To help it accelerate production schedules to meet ramped-up demand and gain further leverage in China’s competitive market, this major foundry requires a strategic partner that can deliver reliable tools on time, achieve rapid installation and qualification and provide robust local support,” said Julian K. Chu, country manager for Mattson Technology’s China Operations. “This new order win extends our foundry leadership and reflects our strengthening partnership with this customer, where we are a supplier of choice, as well as the growth of our market-leading strip position in China.”

About the Aspen III Strip

The Aspen III Strip system features Mattson Technology’s proprietary inductively coupled plasma (ICP) source that effectively strips the resist and residue, reducing the need for post-strip chemical processing. The system achieves excellent results for high-dose implant strip, residue removal and surface cleaning for advanced applications, including low-k and oxygen and non-oxygen-based processes. The Aspen III Strip system offers advanced technology on a high-throughput platform, providing process performance and low cost of ownership advantages to chipmakers for advanced device manufacturing.

About Mattson Technology, Inc.

Mattson Technology, Inc. is a leading supplier of semiconductor wafer processing equipment used in the fabrication of integrated circuits. The company’s dry strip and RTP equipment utilize innovative technology to deliver advanced processing capabilities on high-productivity platforms for the fabrication of current- and next-generation devices. Since beginning operations in 1989, the company’s core vision has been to help bring technology leadership and productivity gains to semiconductor manufacturers worldwide. For more information, please contact Mattson Technology, Inc., 47131 Bayside Parkway, Fremont, Calif. 94538. Telephone: (800) MATTSON/(510) 657-5900. Fax: (510) 492-5911. Internet: www.mattson.com.