Mattson Technology is the productivity and technology leader in the plasma dry strip market. Our strip systems offer the widest process range and feature our patented inductively coupled plasma (ICP) technology. Mattson’s system architecture and strip technology provides the lowest contamination levels at the highest throughput. Complete residue removal is accomplished in one chamber in situ, eliminating the need for organic solvents, thereby reducing process costs and alleviating environmental concerns. Mattson’s strip systems offer our customers the lowest total cost of ownership (TCO) by providing the high yield, fast throughput, reduced process steps and low operating cost.
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Aspen II |
Aspen III ICPHT |
Suprema |
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